- Low-kV high-resolution imaging with enhanced topographic contrast of target layers
- Imaging of edges of delayered or cleaved chips using field-free high-resolution technology
- Dedicated and proprietary gas chemistries for sub-14 nm nodes deprocessing
- End-pointing software module for semiautomated deprocessing enables stopping the process at a desired layer
- Electrical characterization of the most sensitive semiconductor devices using in-situ nanoprobing
- Easy-to-use, fully customizable, applicationoriented and modular user interface
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TCL layer, Intel 14 nm Skylake
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Overview of a 100 μm × 100 μm delayered window on a 10 nm technology node
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Nanoprobing a delayered
10 nm technology node
